Vacuum Magnetron Sputtering
Deposition of coatings by the sputtering technique
The sputtering process starts by creating a glow discharge between two polarised electrodes. This discharge under vacuum leads to ignition of a cold plasma composed of charged particles which collide with a cathode target under an electric field. This bombardment causes sputtering of atoms from the target onto a substrate.
Research and development tool with 450mm diameter chamber
Compact and cost effective tool with high performance
Flagship sputtering tool with 650mm diameter chamber
Production sputtering tool with 850mm diameter chamber
Large chamber sputtering tool with 1100mm diameter chamber
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